A general and ultrafast polishing method with truly atomic roughness

Yi Zhang, Yongjie Zhang, Kaixuan Gu, Linfeng Zhang, Yuanmin Zhu, Dianzi Liu, Hui Deng

Research output: Contribution to journalArticlepeer-review


The advancement of science and technology is always accompanied by better manufacturing precision. Ideally, the highest precision for manufacturing a surface is truly atomic flatness, which implies that all topmost surface atoms are in a single layer of the crystal face. However, almost no methods can achieve this surface with high efficiency at present. Herein, we present a method to fabricate a large-scale truly atomically flat surface with ultrafast speed. Through the selective etching of surface atoms, our method can achieve an atomically flat surface with 0.05 nm Sa roughness. It is notable that the polishing efficiency of our method is more than 1000 times higher than that of conventional methods. We have demonstrated its generality on various single-crystal materials and obtained atomic roughness and an ultrahigh polishing rate. This method has the potential to promote the mass-production of atomic-scale smooth surfaces, the application of third-generation semiconductor materials, and the innovation of advanced technologies.
Original languageEnglish
Pages (from-to)9441–9447
Number of pages7
JournalThe Journal of Physical Chemistry Letters
Issue number42
Early online date12 Oct 2023
Publication statusPublished - 26 Oct 2023

Cite this