Amine-terminated nanoparticle films: pattern deposition by a simple nanostencilling technique and stability studies under X-ray irradiation

P. R. Coxon; J. H. Ahire; S. P. Ashby; M. D. Frogley; Y. Chao

doi:10.1039/c3cp55344b

Amine-terminated nanoparticle films: pattern deposition by a simple nanostencilling technique and stability studies under X-ray irradiation

P. R. Coxon, J. H. Ahire, S. P. Ashby, M. D. Frogley, Y. Chao

Research output: Contribution to journal › Article › peer-review

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Original language	English
Pages (from-to)	5817-5823
Number of pages	7
Journal	Physical Chemistry Chemical Physics
Volume	16
Issue number	12
DOIs	https://doi.org/10.1039/c3cp55344b
Publication status	Published - 1 Jan 2014

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10.1039/c3cp55344b

Coxon_etal_2014
Copyright: the Authors. This article is licensed under a Creative Commons Attribution 3.0 Unported Licence.
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New approach to size selection and thin film growth of silicon quantum dots and applications
Chao, Y.
Engineering and Physical Sciences Research Council
26/05/09 → 25/07/12
Project: Research

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title = "Amine-terminated nanoparticle films: pattern deposition by a simple nanostencilling technique and stability studies under X-ray irradiation",

author = "Coxon, {P. R.} and Ahire, {J. H.} and Ashby, {S. P.} and Frogley, {M. D.} and Y. Chao",

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AU - Frogley, M. D.

AU - Chao, Y.

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DO - 10.1039/c3cp55344b

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Amine-terminated nanoparticle films: pattern deposition by a simple nanostencilling technique and stability studies under X-ray irradiation

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New approach to size selection and thin film growth of silicon quantum dots and applications

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