Corrigendum to “Structural and optical characterization of high-quality ZnO thin films deposited by reactive RF magnetron sputtering” [Mater. Res. Bull. 48 (2013) 1093–1098]

The authors regret that in the above-mentioned paper, the author list "X.L. Zhanga, K.N. Huia,*, K.S. Huib,**, Jai Singha" is incorrect. This author list should read as follows: "Jai Singha, X.L. Zhanga, K.S. Huib,*, K.N. Huia,**".

The authors regret that in the above-mentioned paper, the Acknowledgement "This work is supported by Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology 2010-0023418). This project is also funded by the I2RF of City University of Hong Kong (project no. of 9666010)" is incorrect. This Acknowledgement should read as follows: "This work was supported by Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology 2010-0023418), the 2012 Post-Doc. Development Program of Pusan National University, and the I2RF of City University of Hong Kong (project no. of 9666010)." 

The authors would like to apologise for any inconvenience caused.