Generation of surface plasmon resonance and lossy mode resonance by thermal treatment of ITO thin-films

I. Del Villar; C. R. Zamarreño; M. Hernaez; P. Sanchez; F. J. Arregui; I. R. Matias

doi:10.1016/j.optlastec.2014.12.012

Generation of surface plasmon resonance and lossy mode resonance by thermal treatment of ITO thin-films

I. Del Villar, C. R. Zamarreño, M. Hernaez, P. Sanchez, F. J. Arregui, I. R. Matias

Materials, Manufacturing & Process Modelling

Research output: Contribution to journal › Article › peer-review

39 Citations (Scopus)

Abstract

Silicon wafers coated with Indium Tin Oxide (ITO) by application of sputtering technique have been characterized after different post-annealing techniques, showing that this last factor is critical for the quality of the thin-film and for the creation and tuning of both surface plasmon resonances and lossy mode resonances. By adequate selection of the ITO thin-film thickness both resonances can be tracked in the same spectrum, which can be used in sensor and optical communications fields.

Original language	English
Pages (from-to)	1-7
Number of pages	7
Journal	Optics and Laser Technology
Volume	69
Early online date	23 Dec 2014
DOIs	https://doi.org/10.1016/j.optlastec.2014.12.012
Publication status	Published - 1 Jun 2015

Keywords

Optical resonance
Sensors
Thin films

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10.1016/j.optlastec.2014.12.012

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abstract = "Silicon wafers coated with Indium Tin Oxide (ITO) by application of sputtering technique have been characterized after different post-annealing techniques, showing that this last factor is critical for the quality of the thin-film and for the creation and tuning of both surface plasmon resonances and lossy mode resonances. By adequate selection of the ITO thin-film thickness both resonances can be tracked in the same spectrum, which can be used in sensor and optical communications fields.",

keywords = "Optical resonance, Sensors, Thin films",

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AU - Del Villar, I.

AU - Zamarreño, C. R.

AU - Hernaez, M.

AU - Sanchez, P.

AU - Arregui, F. J.

AU - Matias, I. R.

PY - 2015/6/1

Y1 - 2015/6/1

N2 - Silicon wafers coated with Indium Tin Oxide (ITO) by application of sputtering technique have been characterized after different post-annealing techniques, showing that this last factor is critical for the quality of the thin-film and for the creation and tuning of both surface plasmon resonances and lossy mode resonances. By adequate selection of the ITO thin-film thickness both resonances can be tracked in the same spectrum, which can be used in sensor and optical communications fields.

AB - Silicon wafers coated with Indium Tin Oxide (ITO) by application of sputtering technique have been characterized after different post-annealing techniques, showing that this last factor is critical for the quality of the thin-film and for the creation and tuning of both surface plasmon resonances and lossy mode resonances. By adequate selection of the ITO thin-film thickness both resonances can be tracked in the same spectrum, which can be used in sensor and optical communications fields.

KW - Optical resonance

KW - Sensors

KW - Thin films

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JO - Optics and Laser Technology

JF - Optics and Laser Technology

SN - 0030-3992

ER -

Generation of surface plasmon resonance and lossy mode resonance by thermal treatment of ITO thin-films

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Miguel Hernaez

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Generation of surface plasmon resonance and lossy mode resonance by thermal treatment of ITO thin-films

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Miguel Hernaez

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