Synthesis and properties of crystalline TiO2 films deposited by a HIPIMS+ technique

Q. M. Wang; Se-Hun Kwon; Kwun Nam Hui; Doo-In Kim; Kwan San Hui; Kwang Ho Kim

doi:10.1016/j.vacuum.2011.11.020

Synthesis and properties of crystalline TiO2 films deposited by a HIPIMS+ technique

Q. M. Wang, Se-Hun Kwon, Kwun Nam Hui, Doo-In Kim, Kwan San Hui, Kwang Ho Kim

Energy Materials Laboratory

Research output: Contribution to journal › Article › peer-review

31 Citations (Scopus)

Abstract

Crystalline TiO ₂ thin films were synthesized on the Si and glass substrates by reactive sputtering in a HIPIMS coating system. The films with a bit oxygen deficiency were deposited on the Si and glass substrates at oxygen flux rate of 10 sccm. The phase structure of the films changed with varying the parameters the MPP power pulse, the bias voltage, and working gas pressure. Anatase-dominant, anatase-rutile, and rutile films can be obtained by controlling the deposition parameters. The anatase-dominant and anatase-rutile TiO ₂ films possess good photoinduced hydrophilicity and photocatalytic properties. The rutile films exhibited high dielectric constant. The related mechanism and potential application was discussed.

Original language	English
Pages (from-to)	90-95
Number of pages	6
Journal	Vacuum
Volume	89
Early online date	3 Dec 2011
DOIs	https://doi.org/10.1016/j.vacuum.2011.11.020
Publication status	Published - Mar 2013

Keywords

Dielectric constant
High power impulse magnetron sputtering
Phase structure
Photocatalytic properties
TiO2 film

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10.1016/j.vacuum.2011.11.020

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@article{14a9c51803664cd3b1d8f5953b79364d,

title = "Synthesis and properties of crystalline TiO2 films deposited by a HIPIMS+ technique",

abstract = "Crystalline TiO 2 thin films were synthesized on the Si and glass substrates by reactive sputtering in a HIPIMS coating system. The films with a bit oxygen deficiency were deposited on the Si and glass substrates at oxygen flux rate of 10 sccm. The phase structure of the films changed with varying the parameters the MPP power pulse, the bias voltage, and working gas pressure. Anatase-dominant, anatase-rutile, and rutile films can be obtained by controlling the deposition parameters. The anatase-dominant and anatase-rutile TiO 2 films possess good photoinduced hydrophilicity and photocatalytic properties. The rutile films exhibited high dielectric constant. The related mechanism and potential application was discussed.",

keywords = "Dielectric constant, High power impulse magnetron sputtering, Phase structure, Photocatalytic properties, TiO2 film",

author = "Wang, {Q. M.} and Se-Hun Kwon and Hui, {Kwun Nam} and Doo-In Kim and Hui, {Kwan San} and Kim, {Kwang Ho}",

year = "2013",

month = mar,

doi = "10.1016/j.vacuum.2011.11.020",

language = "English",

volume = "89",

pages = "90--95",

journal = "Vacuum",

issn = "0042-207X",

publisher = "Elsevier",

}

TY - JOUR

T1 - Synthesis and properties of crystalline TiO2 films deposited by a HIPIMS+ technique

AU - Wang, Q. M.

AU - Kwon, Se-Hun

AU - Hui, Kwun Nam

AU - Kim, Doo-In

AU - Hui, Kwan San

AU - Kim, Kwang Ho

PY - 2013/3

Y1 - 2013/3

N2 - Crystalline TiO 2 thin films were synthesized on the Si and glass substrates by reactive sputtering in a HIPIMS coating system. The films with a bit oxygen deficiency were deposited on the Si and glass substrates at oxygen flux rate of 10 sccm. The phase structure of the films changed with varying the parameters the MPP power pulse, the bias voltage, and working gas pressure. Anatase-dominant, anatase-rutile, and rutile films can be obtained by controlling the deposition parameters. The anatase-dominant and anatase-rutile TiO 2 films possess good photoinduced hydrophilicity and photocatalytic properties. The rutile films exhibited high dielectric constant. The related mechanism and potential application was discussed.

AB - Crystalline TiO 2 thin films were synthesized on the Si and glass substrates by reactive sputtering in a HIPIMS coating system. The films with a bit oxygen deficiency were deposited on the Si and glass substrates at oxygen flux rate of 10 sccm. The phase structure of the films changed with varying the parameters the MPP power pulse, the bias voltage, and working gas pressure. Anatase-dominant, anatase-rutile, and rutile films can be obtained by controlling the deposition parameters. The anatase-dominant and anatase-rutile TiO 2 films possess good photoinduced hydrophilicity and photocatalytic properties. The rutile films exhibited high dielectric constant. The related mechanism and potential application was discussed.

KW - Dielectric constant

KW - High power impulse magnetron sputtering

KW - Phase structure

KW - Photocatalytic properties

KW - TiO2 film

UR - http://www.scopus.com/inward/record.url?scp=84869095914&partnerID=8YFLogxK

U2 - 10.1016/j.vacuum.2011.11.020

DO - 10.1016/j.vacuum.2011.11.020

M3 - Article

AN - SCOPUS:84869095914

VL - 89

SP - 90

EP - 95

JO - Vacuum

JF - Vacuum

SN - 0042-207X

ER -

Synthesis and properties of crystalline TiO2 films deposited by a HIPIMS+ technique

Abstract

Keywords

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