Crystalline TiO 2 thin films were synthesized on the Si and glass substrates by reactive sputtering in a HIPIMS coating system. The films with a bit oxygen deficiency were deposited on the Si and glass substrates at oxygen flux rate of 10 sccm. The phase structure of the films changed with varying the parameters the MPP power pulse, the bias voltage, and working gas pressure. Anatase-dominant, anatase-rutile, and rutile films can be obtained by controlling the deposition parameters. The anatase-dominant and anatase-rutile TiO 2 films possess good photoinduced hydrophilicity and photocatalytic properties. The rutile films exhibited high dielectric constant. The related mechanism and potential application was discussed.
- Dielectric constant
- High power impulse magnetron sputtering
- Phase structure
- Photocatalytic properties
- TiO2 film