Thermal evaporation and x-ray photostability of dodecyl-passivated silicon nanoparticles

Paul R. Coxon, Shane P. Ashby, Mark D. Frogley, Yimin Chao

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Original language	English
Article number	355303
Journal	Journal of Physics D: Applied Physics
Volume	45
Issue number	35
DOIs	https://doi.org/10.1088/0022-3727/45/35/355303
Publication status	Published - 2012

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title = "Thermal evaporation and x-ray photostability of dodecyl-passivated silicon nanoparticles",

author = "Coxon, {Paul R.} and Ashby, {Shane P.} and Frogley, {Mark D.} and Yimin Chao",

year = "2012",

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language = "English",

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journal = "Journal of Physics D: Applied Physics",

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T1 - Thermal evaporation and x-ray photostability of dodecyl-passivated silicon nanoparticles

AU - Coxon, Paul R.

AU - Ashby, Shane P.

AU - Frogley, Mark D.

AU - Chao, Yimin

PY - 2012

Y1 - 2012

U2 - 10.1088/0022-3727/45/35/355303

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SN - 0022-3727

VL - 45

JO - Journal of Physics D: Applied Physics

JF - Journal of Physics D: Applied Physics

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